Method of calculating correction for controlling manufacturing process, metrology apparatus, device manufacturing method, and modeling method

摘要

A correction (CPE) for use in control of the lithographic apparatus (100) is calculated. A metrology device (140) is used to measure (200) performance parameters at sampling locations at one or more substrates to which a lithographic process has been previously applied. The process model is fitted 210 to the measured performance parameters to provide an upsampling estimate for the process induced effects on the substrate. A correction is calculated 230 for use in controlling the lithographic apparatus using the operation model and based at least in part on the adapted process model. In locations where measurement data (312) is available, this data is added (240) to the estimate to replace process model values. Thus, the calculation of the actuation correction is based on the change estimate (316) which is a combination of the values (318) estimated by the process model and partly based on the actual measurement data (312). [Selected figure] Figure 2