首页> 外国专利> BUFF POLISHING METHOD, BUFF POLISHING COMPOSITION, AND AQUEOUS EMULSIFIED BUFF POLISHING COMPOSITION FOR AUTOMOBILE PAINTED SURFACE REPAIRING

BUFF POLISHING METHOD, BUFF POLISHING COMPOSITION, AND AQUEOUS EMULSIFIED BUFF POLISHING COMPOSITION FOR AUTOMOBILE PAINTED SURFACE REPAIRING

机译:用于汽车涂装表面修补的BUFF抛光方法,BUFF抛光成分和水性乳化BUFF抛光成分

摘要

To provide a composition for both of buff polishing and buff finishing capable of used both in a buff polishing process and a buff finishing process, and a method for both of buff polishing and buff finishing.SOLUTION: There are provided an aqueous emulsified composition for both of buff polishing and buff finishing, containing no surfactant selected from a cationic surfactant, an anionic surfactant, a nonionic surfactant, (a) a polishing particle of 2 to 20 mass%, (b) a lubricant of 1 to 9 mass%, (c) one or more kind selected from kerosene and/or light oil and/or octamethylcyclotetrasiloxane and/or decamethylcyclopentasiloxane of 2 to 20%, d) a thickening stabilizer of 0.1 to 2.0 mass% and water of 49.0 to 94.9 mass%, in which the polishing particle is metal oxide with true density of 7 or more and volume average 50% particle diameter of the polishing particle is 1 to 5 μm, and capable of being used both in a buff polishing process and a buff finishing process, and a method for both of buff polishing and buff finishing.SELECTED DRAWING: None
机译:为了提供一种既能在抛光抛光过程中又能在抛光过程中同时使用的抛光抛光和抛光过程的组合物,以及抛光抛光和抛光过程两者的方法。抛光抛光和抛光抛光,不包含选自阳离子表面活性剂,阴离子表面活性剂,非离子表面活性剂的表面活性剂,(a)2至20质量%的抛光颗粒,(b)1至9质量%的润滑剂,( c)选自2至20%的煤油和/或轻油和/或八甲基环四硅氧烷和/或十甲基环五硅氧烷的一种或多种,​​d)0.1至2.0质量%的增稠稳定剂和49.0至94.9质量%的水,其中所述抛光颗粒是金属氧化物,其真实密度为7以上,并且所述抛光颗粒的体积平均50%粒径为1至5μm,并且能够在抛光抛光过程和抛光抛光过程中使用,并且该方法对于两个f抛光和抛光抛光。

著录项

  • 公开/公告号JP2019019242A

    专利类型

  • 公开/公告日2019-02-07

    原文格式PDF

  • 申请/专利权人 ISHIHARA CHEMICAL CO LTD;

    申请/专利号JP20170139657

  • 发明设计人 TAGO KAZUTO;KOBAYASHI AKIO;

    申请日2017-07-19

  • 分类号C09K3/14;B24B37;

  • 国家 JP

  • 入库时间 2022-08-21 12:20:32

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