Positive photosensitive siloxane composition, active matrix substrate, display device, and method of manufacturing active matrix substrate

摘要

The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate 30 includes a plurality of gate wirings 11 provided so as to extend parallel to each other on an insulating substrate 10, and a plurality of source wirings 12 provided so as to extend parallel to each other in a direction intersecting the respective gate wirings 11. An interlayer insulating film 14 and a gate insulating film 15 are interposed at portions including the intersecting portions of the gate wirings 11 and the source wirings 12, on a lower side of the source wiring 12. The interlayer insulating film 14 is formed using the positive type photosensitive siloxane composition without using a resist.