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In-line DPS chamber hardware design that allows axial symmetry for improved flow conductance and uniformity
In-line DPS chamber hardware design that allows axial symmetry for improved flow conductance and uniformity
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机译:直插式DPS腔室硬件设计,可实现轴向对称性,以提高流导和均匀性
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摘要
The present disclosure generally relates to apparatus and methods for symmetry in electrical field, gas flow and thermal distribution in a processing chamber to achieve process uniformity. Embodiment of the present disclosure includes a plasma processing chamber having a plasma source, a substrate support assembly and a vacuum pump aligned along the same central axis to create substantially symmetrical flow paths, electrical field, and thermal distribution in the plasma processing chamber resulting in improved process uniformity and reduced skew.
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