Photocurable resin composition for stereolithography production, three-dimensional article produced using the composition, and related production method

摘要

The present invention is (i) at least one radically polymerizable compound (A) represented by the following general formula (I), wherein R1 is a straight chain or branched chain having an average molecular weight of 200 to 3,000 g / mol. A polytetramethylene glycol residue, R2 is a diisocyanate compound residue, R3 is the same or different diisocyanate compound residue from R2, and R4 is AcrO-CH2-CH2-; (AcrO- (AcrO-CH2) 3C-CH2-; AcrO-CH2-CHCH3-, AcrO-CH2-CHC2H5- and (AcrO-CH2) 2C (C2H5) CH2-, and , Acr is CH2 = C (R) -CO-, and R is a hydrogen atom or a methyl group and at least one radical polymerizable compound (A) (Ii) at least one radical polymerizable organic compound (B) different from compound (A), and (iii) a photosensitive radical polymerization initiator (C), wherein the content of the radical polymerizable compound (A) is It is related with the liquid photocurable resin composition for optical shaping | molding which is 5-70 weight% on the basis of the total amount of a compound (A) and (B). The present invention further describes related stereolithographic uses and methods, and the three-dimensional articles produced thereby. [Selection figure] None