PHOTOCURABLE RESIN COMPOSITION FOR STEREOLITHOGRAPHY PRODUCTION, THREE-DIMENSIONAL ARTICLES OBTAINED WITH SAID COMPOSITION, AND A CORRESPONDING PRODUCTION METHOD

摘要

FIELD: manufacturing technology.;SUBSTANCE: invention relates to a method for stereolithography production. Liquid photocurable resin composition for stereolithography contains (i) at least one radically polymerisable compound (A), represented by the following general formula (I): R⁴O-CO-NH-R²-NH-CO-O-R¹-O-CO-NH-R³-NH-CO-OR⁴ (I), where R¹ is a residue of linear or branched polytetramethylene glycol with average molecular weight from 200 to 3,000 g/mol; R² is a residue of a diisocyanate compound; R³ is a residue of a diisocyanate compound, same as or different from R²; and R⁴ selected from AcrO-CH₂-CH₂-; (AcrO-CH₂)₂CH-; (AcrO-CH₂)₃C-CH₂-; AcrO-CH₂-CHCH₃-; AcrO-CH₂-CHC₂H₅- and (AcrO-CH₂)₂C(C₂H₅)CH₂-, preferably AcrO-CH₂-CH₂ and more preferably AcrO-CH₂-CH₂-; where Acr is CH₂=C(R)-CO- and R is a hydrogen atom or a methyl group; (ii) at least one radically polymerisable organic compound (B) other than compound (A); and (iii) a photosensitive radical polymerisation initiator (C), wherein the content of the radically polymerisable compound (A) varies from 5 to 70 wt% of the total amount of the compounds (A) and (B). Invention further describes the corresponding stereolithography application and method, as well as three-dimensional articles obtained using said invention.;EFFECT: invention enables to obtain transparent three-dimensional articles which have a lower surface roughness.;10 cl, 6 ex, 1 tbl