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Determination method and apparatus, program, information recording medium, exposure apparatus, layout information providing method, layout method, mark detection method, exposure method, and device manufacturing method
Determination method and apparatus, program, information recording medium, exposure apparatus, layout information providing method, layout method, mark detection method, exposure method, and device manufacturing method
The determination device (50) sets the pitches in the first direction and the second direction intersecting in a predetermined plane of the plurality of detection areas as D1 and D2, respectively, and forms a two-dimensional array along the first direction and the second direction on the substrate. The sizes in the first direction and the second direction of the plurality of divided areas are respectively W1 and W2, and the pitches of the plurality of marks arranged on the substrate in the first direction and the second direction are p1 and p2, respectively. A calculation unit (10, 12) for calculating the pitch p1 and the pitch p2 of the plurality of marks satisfying the following expressions (a) and (b) based on the pitch D1, the pitch D2, the size W1 and the size W2. p1 = D1 / i (i is a natural number) = W1 / m (m is a natural number) (a) p2 = D2 / j (j is a natural number) = W2 / n (n is a natural number) (b)
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