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Determination method and apparatus, program, information recording medium, exposure apparatus, layout information providing method, layout method, mark detection method, exposure method, and device manufacturing method

机译:确定方法和装置,程序,信息记录介质,曝光装置,布局信息提供方法,布局方法,标记检测方法,曝光方法和器件制造方法

摘要

The determination device (50) sets the pitches in the first direction and the second direction intersecting in a predetermined plane of the plurality of detection areas as D1 and D2, respectively, and forms a two-dimensional array along the first direction and the second direction on the substrate. The sizes in the first direction and the second direction of the plurality of divided areas are respectively W1 and W2, and the pitches of the plurality of marks arranged on the substrate in the first direction and the second direction are p1 and p2, respectively. A calculation unit (10, 12) for calculating the pitch p1 and the pitch p2 of the plurality of marks satisfying the following expressions (a) and (b) based on the pitch D1, the pitch D2, the size W1 and the size W2. p1 = D1 / i (i is a natural number) = W1 / m (m is a natural number) (a) p2 = D2 / j (j is a natural number) = W2 / n (n is a natural number) (b)
机译:确定装置(50)将在多个检测区域的预定平面中相交的第一方向和第二方向上的间距分别设置为D1和D2,并且沿着第一方向和第二方向形成二维阵列。在基材上。多个划分区域在第一方向和第二方向上的尺寸分别为W1和W2,并且在第一方向和第二方向上布置在基板上的多个标记的间距分别为p1和p2。计算单元(10、12),用于基于间距D1,间距D2,尺寸W1和尺寸W2计算满足以下表达式(a)和(b)的多个标记的间距p1和间距p2 。 p1 = D1 / i(i是自然数)= W1 / m(m是自然数)(a)p2 = D2 / j(j是自然数)= W2 / n(n是自然数)( b)

著录项

  • 公开/公告号JPWO2018061811A1

    专利类型

  • 公开/公告日2019-07-04

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20180542387

  • 发明设计人 柴崎 祐一;

    申请日2017-09-15

  • 分类号G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 12:18:28

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