Determining method and apparatus, program, information recording medium, exposure apparatus, layout information providing method, layout method, mark detecting method, exposure method, and device manufacturing method

摘要

The determination device 50 determines the pitches D ₁ and D ₂ in the first direction and the second direction intersecting within a predetermined plane of the plurality of detection regions, The sizes of the first direction and the second direction of each of the plurality of partitioned regions to be arranged are respectively W ₁ and W ₂ and the pitches of the first and second directions of the plurality of marks disposed on the substrate are p ₁ , to p _2, and based on the pitch D _1, the pitch D _2, size W ₁ and the size W _2, the following formula (a), (b) meet, a pitch p ₁ and the pitch p ₂ of the plurality of marks to the And a calculation unit 10, p ₁ = D ₁ / i (i is a natural number) = W ₁ / m (m is a natural number) ... (a) p ₂ = D ₂ / j (j is a natural number) = W ₂ / n (n is a natural number) ... (b)