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Integrated circuits having shielded MEMS devices and methods for fabricating shielded MEMS devices

机译:具有屏蔽的MEMS器件的集成电路以及用于制造屏蔽的MEMS器件的方法

摘要

Integrated circuits having shielded micro-electromechanical system (MEMS) devices and method for fabricating shielded MEMS devices are provided. In an example, an integrated circuit having a shielded MEMS device includes a substrate, a ground plane including conductive material over the substrate, and a dielectric layer over the ground plane. The integrated circuit further includes a MEMS device over the ground plane. Also, the integrated circuit includes a conductive pillar through the dielectric layer and in contact with the ground plane. The integrated circuit includes a metallic thin film over the MEMS device and in contact with the conductive pillar, wherein the metallic thin film, the conductive pillar and the ground plane form an electromagnetic shielding structure surrounding the MEMS device. Further, the integrated circuit includes an acoustic shielding structure over the substrate and adjacent the electromagnetic shielding structure.
机译:提供了具有屏蔽的微机电系统(MEMS)器件的集成电路以及用于制造屏蔽的MEMS器件的方法。在一个示例中,具有屏蔽的MEMS器件的集成电路包括:衬底;包括在衬底上的导电材料的接地平面;以及在接地平面上的介电层。该集成电路还包括在接地平面上的MEMS器件。而且,集成电路包括穿过电介质层并与接地平面接触的导电柱。集成电路包括在MEMS器件上方并与导电柱接触的金属薄膜,其中金属薄膜,导电柱和接地平面形成围绕MEMS器件的电磁屏蔽结构。此外,集成电路包括在衬底上方并与电磁屏蔽结构相邻的声屏蔽结构。

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