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Wafer scale monolithic integration of lasers, modulators, and other optical components using ALD optical coatings
Wafer scale monolithic integration of lasers, modulators, and other optical components using ALD optical coatings
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机译:使用ALD光学涂层的激光器,调制器和其他光学组件的晶片级单片集成
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摘要
After forming a monolithically integrated device including a laser and a modulator on a semiconductor substrate, an anti-reflection coating layer is formed over the monolithically integrated device and the semiconductor substrate by an atomic layer deposition (ALD) process. The anti-reflection coating layer is lithographically patterned so that an anti-reflection coating is only present on exposed surfaces of the modulator. After forming an etch stop layer portion to protect the anti-reflection coating, a high reflection coating layer is formed over the etch stop layer, the laser and the semiconductor structure by ALD and lithographically patterned to provide a high reflection coating that is formed solely on a non-output facet of the laser.
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