首页> 外国专利> Metal-semiconductor heterodimension field effect transistors (MESHFET) and high electron mobility transistor (HEMT) based device and method of making the same

Metal-semiconductor heterodimension field effect transistors (MESHFET) and high electron mobility transistor (HEMT) based device and method of making the same

机译:基于金属半导体异尺寸场效应晶体管(MESHFET)和高电子迁移率晶体管(HEMT)的器件及其制造方法

摘要

A semiconductor device is provided that comprises a base structure, a first channel layer overlying the base structure, a second channel layer overlying the first channel layer, and first, second, and third ohmic contacts overlying the second channel layer. The semiconductor device further comprises a metal-semiconductor heterodimension field effect transistor that is formed between the first and second ohmic contacts, the metal-semiconductor heterodimension field effect transistor including a first gate formed through the first and second channel layers. The semiconductor device yet further comprises a high electron mobility transistor formed between the second and third ohmic contacts, the high electron mobility transistor including a second gate formed through the second channel layer without extending through the first channel layer.
机译:提供了一种半导体器件,该半导体器件包括基础结构,覆盖基础结构的第一沟道层,覆盖第一沟道层的第二沟道层,以及覆盖第二沟道层的第一,第二和第三欧姆接触。该半导体器件还包括形成在第一和第二欧姆接触之间的金属-半导体异尺寸场效应晶体管,该金属-半导体异尺寸场效应晶体管包括穿过第一和第二沟道层形成的第一栅极。半导体器件还进一步包括形成在第二和第三欧姆接触之间的高电子迁移率晶体管,该高电子迁移率晶体管包括穿过第二沟道层形成而不延伸穿过第一沟道层的第二栅极。

著录项

  • 公开/公告号US10153273B1

    专利类型

  • 公开/公告日2018-12-11

    原文格式PDF

  • 申请/专利权人 ROGER S. TSAI;WEIDONG LIU;YEONG-CHANG CHOU;

    申请/专利号US201715832377

  • 申请日2017-12-05

  • 分类号H01L27/06;H01L29/207;H01L29/423;H01L29/778;H01L29/80;H01L49/02;H01L21/8252;H01L29/66;H01L21/764;H01L21/74;H01L21/285;H01L21/3213;H01L23/528;H01L23/482;H01L23/66;H01L29/205;

  • 国家 US

  • 入库时间 2022-08-21 12:14:37

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