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Apparatus and method for neutron transmutation doping of semiconductor wafers
Apparatus and method for neutron transmutation doping of semiconductor wafers
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机译:半导体晶片的中子trans变掺杂的设备和方法
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摘要
In various embodiments, a method of processing one or more semiconductor wafers is provided. The method includes positioning the one or more semiconductor wafers in an irradiation chamber, generating a neutron flux in a spallation chamber coupled to the irradiation chamber, moderating the neutron flux to produce a thermal neutron flux, and exposing the one or more semiconductor wafers to the thermal neutron flux to thereby induce the creation of dopant atoms in the one or more semiconductor wafers.
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