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Gate contact structure over active gate and method to fabricate same

机译:有源栅极上的栅极接触结构及其制造方法

摘要

Gate contact structures disposed over active portions of gates and methods of forming such gate contact structures are described. For example, a semiconductor structure includes a substrate having an active region and an isolation region. A gate structure has a portion disposed above the active region and a portion disposed above the isolation region of the substrate. Source and drain regions are disposed in the active region of the substrate, on either side of the portion of the gate structure disposed above the active region. A gate contact structure is disposed on the portion of the gate structure disposed above the active region of the substrate.
机译:描述了设置在栅极的有源部分上的栅极接触结构以及形成这种栅极接触结构的方法。例如,半导体结构包括具有有源区和隔离区的衬底。栅极结构具有设置在有源区上方的部分和设置在衬底的隔离区上方的部分。源极区和漏极区设置在衬底的有源区中,位于栅极结构的位于有源区上方的部分的任一侧。栅极接触结构设置在栅极结构的位于衬底的有源区上方的部分上。

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