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Local carbon-supply device and method for preparing wafer-level graphene single crystal by local carbon supply

机译:通过局部供碳制备晶圆级石墨烯单晶的局部供碳装置及方法

摘要

The present disclosure provides a local carbon-supply device and a method for preparing a wafer-level graphene single crystal by local carbon supply. The method includes: providing the local carbon-supply device; preparing a nickel-copper alloy substrate, placing the nickel-copper alloy substrate in the local carbon-supply device; placing the local carbon-supply device provided with the nickel-copper alloy substrate in a chamber of a chemical vapor-phase deposition system, and introducing a gaseous carbon source into the local carbon-supply device to grow the graphene single crystal on the nickel-copper alloy substrate. A graphene prepared by embodiments of the present disclosure has the advantages of good crystallinity of a crystal domain, simple preparation condition, low cost, a wider window of condition parameters required for growth, and good repeatability, which lays a foundation for wide application of the wafer-level graphene single crystal in a graphene apparatus and other fields.
机译:本公开提供了一种局部碳供应装置和通过局部碳供应来制备晶片级石墨烯单晶的方法。该方法包括:提供局部碳供应装置;以及准备镍铜合金基体,将该镍铜合金基体放置在局部供碳装置中;将配备有镍-铜合金基材的局部碳供应装置放置在化学气相沉积系统的腔室中,并将气态碳源引入局部碳供应装置中,以在镍-镍-镍合金上生长石墨烯单晶。铜合金基板。通过本发明实施例制备的石墨烯具有晶域结晶性好,制备条件简单,成本低,生长所需的条件参数窗口宽,重复性好等优点,为其广泛应用奠定了基础。石墨烯装置等领域中的晶圆级石墨烯单晶。

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