首页> 外国专利> HIGH-RESISTIVITY SINGLE CRYSTAL ZINC OXIDE WAFER BASED RADIATION DETECTOR AND PREPARATION METHOD AND USE THEREOF

HIGH-RESISTIVITY SINGLE CRYSTAL ZINC OXIDE WAFER BASED RADIATION DETECTOR AND PREPARATION METHOD AND USE THEREOF

机译:基于高电阻率的单晶氧化锌晶片的辐射探测器及其制备方法和用途

摘要

The present invention discloses a high-resistivity single crystal zinc oxide (ZnO) wafer and a high-resistivity single crystal ZnO-based radiation detector, and preparation method and use thereof. The preparation method of the high-resistivity single crystal zinc oxide wafer is to place a single crystal ZnO wafer in a metal lithium electrochemical device for a constant-current discharge treatment, and then to place the single crystal ZnO wafer in a high-pressure oxygen atmosphere at 800 to 1000° C. and 10 to 30 atm for an annealing treatment for 20 to 28 hours. The preparation method of the radiation detector is to evaporate a metal electrode layer at both sides of the high-resistivity single crystal ZnO wafer, then to bond the wafer onto a circuit board, and to connect the wafer with the circuit board by a gold thread.
机译:本发明公开了一种高电阻率的单晶氧化锌(ZnO)晶片和高电阻率的单晶ZnO基放射线检测器及其制备方法和用途。高电阻率单晶氧化锌晶片的制备方法是将单晶ZnO晶片放置在金属锂电化学装置中进行恒流放电处理,再将单晶ZnO晶片放置在高压氧中。在800至1000℃和10至30atm的气氛中进行20至28小时的退火处理。放射线检测器的制备方法是蒸发高电阻率单晶ZnO晶片两侧的金属电极层,然后将晶片粘结到电路板上,并通过金线将晶片与电路板连接起来。 。

著录项

  • 公开/公告号US2019115489A1

    专利类型

  • 公开/公告日2019-04-18

    原文格式PDF

  • 申请/专利权人 SUN YAT-SEN UNIVERSITY;

    申请/专利号US201816212568

  • 发明设计人 FENG HUANG;XU JI;MEI DONG;KUN YAN;

    申请日2018-12-06

  • 分类号H01L31/18;C30B29/16;C30B33/04;H01L31/0296;H01L31/08;H01L31/0224;H01L31/02;

  • 国家 US

  • 入库时间 2022-08-21 12:08:50

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