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Method for transistor design with considerations of process, voltage and temperature variations

机译:考虑工艺,电压和温度变化的晶体管设计方法

摘要

A method for selecting transistor design parameters. A first set of simulations is used to calculate leakage current at a plurality of sets of design parameter values, and the results are fitted with a first response surface methodology model. The first model is used to generate a function that returns a value of a selected design parameter, for which a leakage current specification is just met. A second set of simulations is used to calculate effective drive current for a plurality of sets of design parameter values, and the results are fitted with a second response surface methodology model. The second model is used, together with the first, to search for a set of design parameter values at which a worst-case effective drive current is greatest, subject to the constraint of meeting the worst-case leakage current specification.
机译:一种选择晶体管设计参数的方法。第一组仿真用于计算多组设计参数值下的泄漏电流,并且结果与第一响应面方法模型拟合。第一个模型用于生成一个函数,该函数返回所选设计参数的值,为此,它刚刚满足泄漏电流的要求。第二组仿真用于计算多组设计参数值的有效驱动电流,并将结果与​​第二响应面方法模型拟合。第二个模型与第一个模型一起用于搜索一组设计参数值,在这些参数下,最坏情况的有效驱动电流最大,但要满足最坏情况的泄漏电流指标。

著录项

  • 公开/公告号US10146896B2

    专利类型

  • 公开/公告日2018-12-04

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US201615344346

  • 发明设计人 JING WANG;NUO XU;WOOSUNG CHOI;

    申请日2016-11-04

  • 分类号G06F17;G06F17/50;H01L27/02;H01L29/06;H01L29/423;H01L29/45;

  • 国家 US

  • 入库时间 2022-08-21 12:07:44

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