首页> 外国专利> SYSTEM AND METHOD FOR CONTROLLING SEMICONDUCTOR MANUFACTURING FACILITY, METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING THE SYSTEM AND METHOD, AND METHOD OF MANUFACTURING PROCESSOR USING THE SYSTEM AND METHOD

SYSTEM AND METHOD FOR CONTROLLING SEMICONDUCTOR MANUFACTURING FACILITY, METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING THE SYSTEM AND METHOD, AND METHOD OF MANUFACTURING PROCESSOR USING THE SYSTEM AND METHOD

机译:控制半导体制造设施的系统和方法,使用该系统和方法制造集成电路的方法以及使用该系统和方法制造处理器的方法

摘要

A method for controlling a semiconductor manufacturing facility includes measuring output change amounts of differential pressure sensors in the facility when pressure conditions change by a number of fans. The fans are then classified into different groups and subgroups and control sequences of the subgroups are determined based on the change amounts. Difference values are then calculated, and a control signal is generated to adjust the rotation speed of the fans.
机译:一种用于控制半导体制造设备的方法,包括:当压力条件由多个风扇改变时,测量设备中的压差传感器的输出变化量。然后,将风扇分为不同的组和子组,并基于变化量确定子组的控制顺序。然后计算差值,并产生控制信号以调节风扇的转速。

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