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SYSTEM AND METHOD FOR CONTROLLING SEMICONDUCTOR MANUFACTURING FACILITY, METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING THE SYSTEM AND METHOD, AND METHOD OF MANUFACTURING PROCESSOR USING THE SYSTEM AND METHOD
SYSTEM AND METHOD FOR CONTROLLING SEMICONDUCTOR MANUFACTURING FACILITY, METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING THE SYSTEM AND METHOD, AND METHOD OF MANUFACTURING PROCESSOR USING THE SYSTEM AND METHOD
A method for controlling a semiconductor manufacturing facility includes measuring output change amounts of differential pressure sensors in the facility when pressure conditions change by a number of fans. The fans are then classified into different groups and subgroups and control sequences of the subgroups are determined based on the change amounts. Difference values are then calculated, and a control signal is generated to adjust the rotation speed of the fans.
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