首页> 外国专利> Vertical Steep-Slope Field-Effect Transistor (I-MOSFET) with Offset Gate Electrode for Driving a Perpendicular Magnetic Tunnel Junction (PMTJ)

Vertical Steep-Slope Field-Effect Transistor (I-MOSFET) with Offset Gate Electrode for Driving a Perpendicular Magnetic Tunnel Junction (PMTJ)

机译:具有偏置栅极的垂直陡坡场效应晶体管(I-MOSFET),用于驱动垂直磁隧道结(PMTJ)

摘要

According to one embodiment, an apparatus includes a bottom electrode layer positioned above a substrate in a film thickness direction, a source layer positioned above the bottom electrode layer in the film thickness direction, an impact ionization channel (i-channel) layer positioned above the source layer in the film thickness direction, a drain layer positioned above the i-channel layer in the film thickness direction, an upper electrode layer positioned above the drain layer in the film thickness direction that forms a stack that includes the bottom electrode layer, the source layer, the i-channel layer, the drain layer, and the upper electrode layer, and a gate layer positioned on sides of the i-channel layer along a plane perpendicular to the film thickness direction in an element width direction. The gate layer is positioned closer to the drain layer than the source layer. Other apparatuses are described in accordance with more embodiments.
机译:根据一个实施例,一种设备包括:沿膜厚度方向位于基板上方的底部电极层;沿膜厚度方向位于底部电极层上方的源极层;位于所述膜上方的碰撞电离通道(i沟道)层。在膜厚度方向上的源极层,在膜厚度方向上位于i沟道层上方的漏极层,在膜厚度方向上位于漏极层上方的上部电极层,其形成包括底部电极层的叠层,源极层,i沟道层,漏极层和上部电极层,以及栅极层沿着与元件宽度方向上的膜厚方向垂直的平面位于i沟道层的侧面。栅极层比源极层更靠近漏极层。根据更多实施例描述了其他装置。

著录项

  • 公开/公告号US2019206935A1

    专利类型

  • 公开/公告日2019-07-04

    原文格式PDF

  • 申请/专利权人 SPIN MEMORY INC.;

    申请/专利号US201715859139

  • 申请日2017-12-29

  • 分类号H01L27/22;H01L29/10;H01L29/08;H01L29/78;H01L29/423;H01L29/417;H01L29/45;H01L29/167;H01L29/165;H01L43/08;H01L43/02;G11C11/16;H01L29/66;H01L43/12;

  • 国家 US

  • 入库时间 2022-08-21 12:06:06

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