VANADIUM SILICON NITRIDE FILM, VANADIUM SILICON NITRIDE FILM COATED MEMBER, AND METHOD FOR MANUFACTURING SAME.

摘要

The vanadium silicon nitride film according to the present invention formed as a hard coating film for a substrate satisfies the conditions 0.30 = a/b = 1.7 and 0.24 = b = 0.36, where a = vanadium element concentration [at%]/(vanadium element concentration [at%] + silicon element concentration [at%] + nitrogen element concentration [at%]), and b = silicon element concentration [at%]/(vanadium element concentration [at%] + silicon element concentration [at%] + nitrogen element concentration [at%]), and has a hardness of 2300 HV or greater.