PREPARATION METHOD FOR MOTH EYE MICROSTRUCTURE, ANTI-REFLECTION SUBSTRATE AND ELECTRONIC PRODUCT

摘要

A preparation method for a moth eye microstructure (207), an anti-reflection substrate and an electronic product, relating to the field of display technology. The method comprises: providing a base layer (201); forming a metal film layer (202) on the base layer; etching the metal film layer (202) to obtain an anti-reflection moth eye microstructure pattern (206); and oxidizing the metal film layer(202) to further form the anti-reflection moth eye microstructure (207) on the base layer (201). According to the method, an ideal microstructure morphology and depth-to-width ratio can be obtained through etching, and the moth eye microstructure (207) with high depth-to-width ratio can be prepared.