HIGH THROUGHPUT MOLECULAR BEAM EPITAXY AND APPARATUS FOR SELECTIVE EPITAXY

摘要

An apparatus is provided which comprises: a chamber for molecular beam epitaxy (MBE); an effusion source at least partially embedded in the chamber; a handle in the chamber to hold a substrate; and a signal source to provide a bias to the substrate, wherein the bias is to influence a trajectory of a material from the effusion source to the substrate.