首页> 外国专利> SINGLE-CRYSTAL ALN PRODUCTION METHOD AND SINGLE-CRYSTAL ALN

SINGLE-CRYSTAL ALN PRODUCTION METHOD AND SINGLE-CRYSTAL ALN

机译:单晶Aln的生产方法及单晶Aln

摘要

This single-crystal AlN production method performs a process comprising a first growth layer formation step and a second growth layer formation step. In the first growth layer formation step, an AlN-containing first growth layer is formed wherein a void layer which is a void in a shape having a longitudinal direction thereof oriented along the a-axis of the crystal, as a result of preferential crystal growth in the a-axis direction over that in the c-axis direction. In the second growth layer formation step, a second growth layer containing single-crystal AlN that has been grown as a result of preferential crystal growth in the c-axis direction over that in the a-axis direction is formed on the first growth layer, by performing the process of, with respect to the processing conditions for the first growth layer formation step, raising the temperature and/or lowering the partial pressure of a nitrogen-based gas which is a gas at least containing N atoms.
机译:该单晶AlN制造方法执行包括第一生长层形成步骤和第二生长层形成步骤的工艺。在第一生长层形成步骤中,形成含AlN的第一生长层,其中,作为优先的晶体生长的结果,形成有空隙层,该空隙层是其长度方向沿着晶体的a轴取向的形状的空隙。在a轴方向上超过在c轴方向上。在第二生长层形成步骤中,在第一生长层上形成第二生长层,该第二生长层包含由于在c轴方向上比在a轴方向上的优先晶体生长而生长的单晶AlN。通过对第一生长层形成步骤的处理条件进行处理,以升高温度和/或降低作为至少包含N原子的气体的氮基气体的分压。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号