METHOD FOR PRODUCING A SEMI-TRANSPARENT DISPLAY AND A SEMI-TRANSPARENT DISPLAY

摘要

The invention relates to a semi-transparent display and to a method for producing a semi-transparent display comprising the following method steps: a) providing an SOI wafer (100), the surface of which has at least one pixel region (109) and at least one contact region (110) arranged next to the pixel region (109), the SOI wafer (100) comprising a silicon substrate (101) on the rear side; b) depositing at least one electromagnetic-radiation-emitting layer (201) on the front side of the SOI wafer (100); c) applying at least one transparent cover layer (202) above the at least one electromagnetic-radiation-emitting layer (201); d) fastening a wiring carrier (501; 601) to the assembly, which at least comprises the SOI wafer (100), the electromagnetic-radiation-emitting layer (201) and the transparent cover layer (202). Before the fastening of the wiring carrier (501; 601) to the assembly consisting of the SOI wafer (100), the electromagnetic-radiation-emitting layer (201) and the transparent cover layer (202), the silicon substrate (101) is removed from the assembly, whereby a remaining assembly (301) is produced, and electrically conductive connections are formed between the contact region (110) of the SOI wafer (100) and the wiring carrier (501; 601) from the rear side of the SOI wafer (100).