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Thin film electroluminescent displays produced using sol-gel methods

机译:使用溶胶 - 凝胶方法生产的薄膜电致发光显示器

摘要

An inverted double insulating thin film electroluminescent (TFEL) display has been fabricated using all sol-gel methods. This involved the production of three film types, an insulating material, a conducting film and a luminescent film. The layers have been evaluated individually and the combination effects are also looked at. The optimised film choice for the display is then given.ududThis investigation focused on manganese doped zinc sulphide (ZnS:Mn), which has a strong orange emission due to the Mn2+ 4 Ti(4G) -» 6Ai(6S) transitions. It is produced from sol-gel deposited zinc oxide films. The oxide films are converted to zinc sulphide by annealing in a hydrogen sulphide-containing atmosphere. The conversion process was investigated and it was found that it takes place in a two-step process that is controlled by diffusion. The parameters of the conversion were optimised to produce the doped zinc sulphide having the changes in structure and composition as a function of sulphidation temperature and annealing time. It has been found that, after an initial “dead time”, conversion takes place in a two-step manner where, for an initial period of approximately 60 mins. little diffusion takes place followed by faster diffusion with a diffusion coefficient of 7.8xl0~18 mV1, which is independent of sulphur concentration. It is also found that the sulphide forms the hexagonal, wurtzite phase with a strong (002) orientation.ududThe emission due to the Mn2+ 4Ti(4G) 6Ai(6S) transitions has been investigated using photoluminescence (PL), cathodoluminescence (CL), and electroluminescence (EL) and the correlation between the luminescence produced by the various methods has been studied. A comparison of the spectra using PL, CL and EL has shown how these excitation methods can be used to quantify the electroluminescence produced by the zinc sulphide. The luminescent properties of ZnS:Mn films have been investigated for their application as an emission layer in the thin film electroluminescent display. The luminescence of the device depends on the structure of the device and various structures were fabricated and the luminous output investigated. It was found in this case that the optimum structure is a five layer inverted structure. The luminescent properties also depend on the insulating films used in the device and their properties. In this case two insulating materials were investigated.ududThe insulating films used in the device were both tantalum pentoxide (Ta20s) and silicon dioxide (SiC>2 ). Devices using both materials have been produced. The properties and the interaction between the emission layer and the insulating layer were investigated. The effect of the crystal structure of the Ta20s on the luminescent properties of the device was also investigated. The luminescent characteristics of the fabricated devices have been measured and a comparison is made with the characteristics of sol-gel TFEL devices using SiC>2 insulators. The TFEL devices with the Ta2 0 5 insulators have shown higher stability and more reliability in theiroperation Therefore Ta2Os is the preferred choice as an insulating material The conducting material chosen for this device is aluminium doped zinc oxide (ZnO Al) as it is a transparent conductor that is compatible with the insulating materials and enhances the performance of the device
机译:已经使用所有溶胶-凝胶方法制造了倒置的双绝缘薄膜电致发光(TFEL)显示器。这涉及三种膜类型的生产,绝缘材料,导电膜和发光膜。已对各个层进行了评估,并查看了组合效果。然后,给出了用于显示器的最佳薄膜选择。 ud ud该研究集中于掺杂锰的硫化锌(ZnS:Mn),由于Mn2 + 4 Ti(4G)-»6Ai(6S)的跃迁而具有强烈的橙色发光。 。它是由溶胶-凝胶沉积的氧化锌薄膜制成的。通过在含硫化氢的气氛中退火,将氧化物膜转化为硫化锌。研究了转化过程,发现转化过程是由扩散控制的两步过程。优化转化参数以产生掺杂的硫化锌,其结构和组成随硫化温度和退火时间的变化而变化。已经发现,在初始的“死时间”之后,以两步方式进行转换,其中在大约60分钟的初始时间段内。扩散很少,随后扩散更快,扩散系数为7.8x10〜18 mV1,与硫浓度无关。还发现硫化物形成具有强(002)取向的六方纤锌矿相。 ud ud使用光致发光(PL),阴极发光研究了由于Mn2 + 4Ti(4G)6Ai(6S)跃迁引起的发射( CL),电致发光(EL)以及通过各种方法产生的发光之间的相关性已得到研究。使用PL,CL和EL进行的光谱比较显示,如何使用这些激发方法来量化硫化锌产生的电致发光。已经研究了ZnS:Mn薄膜的发光特性,将其用作薄膜电致发光显示器中的发光层。器件的发光取决于器件的结构,制造了各种结构并研究了发光输出。在这种情况下,发现最佳结构是五层倒置结构。发光性质还取决于装置中使用的绝缘膜及其性质。在这种情况下,研究了两种绝缘材料。 ud ud设备中使用的绝缘膜都是五氧化二钽(Ta2Os)和二氧化硅(SiC> 2)。已经生产出使用两种材料的器件。研究了发光层和绝缘层之间的性质和相互作用。还研究了Ta2Os的晶体结构对器件发光性能的影响。测量了所制造器件的发光特性,并与使用SiC> 2绝缘体的溶胶-凝胶TFEL器件的特性进行了比较。带有Ta2 0 5绝缘体的TFEL器件在操作中显示出更高的稳定性和可靠性,因此Ta2Os是首选的绝缘材料。该器件选择的导电材料是掺杂铝的氧化锌(ZnO Al),因为它是透明导体。与绝缘材料兼容并增强设备性能

著录项

  • 作者

    Lydon Kavanagh Yvonne;

  • 作者单位
  • 年度 2004
  • 总页数
  • 原文格式 PDF
  • 正文语种 en
  • 中图分类
  • 入库时间 2022-08-20 21:55:42

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