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FILM THICKNESS MEASUREMENT DEVICE, FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT PROGRAM, AND RECORDING MEDIUM FOR RECORDING FILM THICKNESS MEASUREMENT PROGRAM
FILM THICKNESS MEASUREMENT DEVICE, FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT PROGRAM, AND RECORDING MEDIUM FOR RECORDING FILM THICKNESS MEASUREMENT PROGRAM
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机译:膜厚测量装置,膜厚测量方法,膜厚测量程序以及用于记录膜厚测量程序的记录介质
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摘要
A film thickness measurement device 1 is provided with a light output unit 12 for outputting measurement light L1, a spectroscopic detection unit 13 for spectroscopically detecting light L2 to be detected, and an analysis unit 15 for comparing, against a theoretical reflectance, an actually-measured reflectance for respective wavelengths of a measurement subject S obtained from detection results from the spectroscopic detection unit 13 and analyzing a film thickness of a first film 4 and a film thickness of a second film 5. The analysis unit 15 uses comparison results of actually-measured reflectance and theoretical reflectance for each of the wavelengths from the measurement subject S in a first wavelength range to find a candidate optimal solution for film thickness, and uses comparison results of actually-measured reflectance and theoretical reflectance for each of the wavelengths from the measurement subject S in a second wavelength range different from the first wavelength range to find the optimal solution for film thickness from among candidate optimal solutions.
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