首页> 外文会议>Organic Photovoltaics VII; Proceedings of SPIE-The International Society for Optical Engineering; vol.6334 >TOF mobility measurements in pristine films of P3HT: control of hole injection and influence of film thickness
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TOF mobility measurements in pristine films of P3HT: control of hole injection and influence of film thickness

机译:P3HT原始膜中的TOF迁移率测量:控制空穴注入和膜厚的影响

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Time-of-flight (TOF) photocurrent measurements have been used to study charge transport in films of regioregular poly(3-hexylthiophene) (P3HT). Devices in which the P3HT film had been deposited directly onto an indium tin oxide (ITO) electrode produced high dark currents as a result of hole injection into P3HT from ITO. Photocurrent transients in such devices were disperse. It was found however, that these dark currents could be significantly reduced by inserting a dense TiO_2 layer between the ITO and the polymer film. The resulting devices gave non-dispersive transients with hole and electron mobilities in the range of 1 - 2 10~(-4) cm~2 V~(-1) s~(-1) at room temperature. The mobility values were observed to be almost independent of film thickness over the range of 350 nm to 4.3 μm. Temperature dependence studies showed a weak dependence on temperature with a low energetic disorder parameter according to analysis using the Gaussian Disorder Model (GDM) of 71 meV.
机译:飞行时间(TOF)光电流测量已用于研究区域规则聚(3-己基噻吩)(P3HT)薄膜中的电荷传输。 P3HT膜直接沉积在铟锡氧化物(ITO)电极上的设备由于空穴从ITO注入P3HT而产生高的暗电流。这样的器件中的光电流瞬变被分散。但是,发现通过在ITO和聚合物膜之间插入致密的TiO_2层可以显着降低这些暗电流。所得到的器件在室温下给出的空穴和电子迁移率在1-2 10〜(-4)cm〜2 V〜(-1)s〜(-1)范围内的非分散瞬态。在350 nm至4.3μm的范围内,观察到迁移率值几乎与膜厚度无关。温度依赖性研究表明,根据使用71 meV的高斯障碍模型(GDM)进行的分析,能量依赖性参数低,对温度的依赖性较小。

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