LOW TEMPERATURE PLASMA REACTION DEVICE AND HYDROGEN SULPHIDE DECOMPOSITION METHOD

摘要

A low temperature plasma reaction device and a hydrogen sulphide decomposition method, the reaction device comprising: a first cavity (1); a second cavity (2), the second cavity (2) being embedded inside or outside the first cavity (1); an inner electrode (3), the inner electrode being arranged in the first cavity (1); an outer electrode (4); and a barrier medium arranged between the outer electrode and the inner electrode. The hydrogen sulphide decomposition method comprises: implementing dielectric barrier discharge at the outer electrode (4) and the inner electrode (3) of the low temperature plasma reaction device, introducing a raw material gas containing hydrogen sulphide into the first cavity (1) to implement a hydrogen sulphide decomposition reaction, and continuously introducing a thermally conductive medium into the second cavity (2) in order to control the temperature of the first cavity (1) of the low temperature plasma reaction device.