substrate support stage and substrate treatment apparatus including the same and processing method using the same

摘要

The present invention relates to a substrate supporting stage, a substrate processing apparatus using the substrate supporting stage, and a substrate processing method using the substrate supporting stage. More particularly, the present invention relates to a substrate supporting stage, And at least one floating region formed on one surface facing the substrate so as to allow the substrate to float so as to float at least a part of the substrate and a base A step of providing a substrate to be irradiated with light on a substrate supporting stage including a vibration module which is at least partially provided in contact with or in contact with the substrate so as to be capable of vibrating the substrate, And a step of moving the substrate supporting stage in one direction, By performing a process of performing, it is possible to suppress the occurrence of surface unevenness caused by streaks on the light irradiated on the substrate. In other words, in the process of irradiating the laser beam in a predetermined region and processing, it is possible to suppress the occurrence of unevenness as the laser beam changes every shot, and when the substrate is placed on the stage, It is possible to reduce the unevenness in the irradiation of the laser beam due to the unevenness due to the difference in the distance between the substrate and the laser beam due to the unevenness.