首页> 外国专利> PRETREATMENT METHOD FOR COPPER-PLATING OF FPCB VIA HOLE

PRETREATMENT METHOD FOR COPPER-PLATING OF FPCB VIA HOLE

机译:通过孔对FPCB镀铜的预处理方法

摘要

The present invention relates to a pretreatment method for copper-plating of a FPCB via hole. The pretreatment method comprises: a hole forming step of punching a through hole for forming a via hole in a copper clad laminate composed of a polyimide film and a copper film; a pre-etching step including an etching solution spraying process of applying an etchant to the copper clad laminate having the through hole to wet both surfaces of the copper clad laminate, and a first etching solution dipping step of passing the copper clad laminate through a dipping bath containing the etchant; a carbon lapping step of forming a carbon nanoparticle layer on both surfaces of the copper clad laminate and the through hole after the pre-etching step; a micro-etching step including an etchant solution spraying process of spraying the etchant only on a surface of the copper clad laminate after the completion of the carbon lapping step to physically remove the carbon nanoparticle layer formed on both surfaces of the copper clad laminate; and an inspection step of inspecting a state of the carbon nanoparticle layer in the through hole after the completion of the micro-etching step. According to the pretreatment method for copper-plating of a FPCB via hole of the present invention as described above, carbon nanoparticles promoting copper-plating are laminated in advance on the inner circumferential surface of the via hole to form a copper-plating layer with a uniform thickness in the via hole when processing plating, thereby improving the electrical reliability of an FPCB.;COPYRIGHT KIPO 2019
机译:本发明涉及一种用于对FPCB通孔进行镀铜的预处理方法。预处理方法包括:形成孔的步骤,该步骤在由聚酰亚胺膜和铜膜组成的覆铜层压板中冲孔以形成通孔。预蚀刻步骤,包括将蚀刻剂施加到具有通孔以浸湿覆铜层压板的两个表面的浸铜覆层的蚀刻溶液喷涂工艺,以及使浸铜覆层通过浸入的第一蚀刻溶液浸入步骤。含有蚀刻剂的浴;碳研磨步骤,在预蚀刻步骤之后,在覆铜层压板和通孔的两个表面上形成碳纳米颗粒层;微蚀刻步骤,包括蚀刻剂溶液喷涂工艺,其在完成碳研磨步骤之后仅将蚀刻剂喷涂在覆铜层压板的表面上,以物理地去除在覆铜层压板的两个表面上形成的碳纳米颗粒层;在微蚀刻步骤完成之后,检查通孔中的碳纳米颗粒层的状态的检查步骤。如上所述,根据本发明的用于FPCB通孔的镀铜的预处理方法,将促进镀铜的碳纳米颗粒预先层压在通孔的内周表面上,以形成具有铜纳米管的镀铜层。处理电镀时通孔厚度均匀,从而提高FPCB的电气可靠性。; COPYRIGHT KIPO 2019

著录项

  • 公开/公告号KR20190009112A

    专利类型

  • 公开/公告日2019-01-28

    原文格式PDF

  • 申请/专利权人 ACT CO. LTD.;

    申请/专利号KR20170090907

  • 发明设计人 KIM DONG YOUBKR;SONG HO YEONGKR;

    申请日2017-07-18

  • 分类号H05K3/40;H05K3;

  • 国家 KR

  • 入库时间 2022-08-21 11:51:45

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