ANTISTATIC DEVICE AND SUBSTRATE MACHINING APPARATUS COMPRISING THE ANTISTATIC DEVICE

摘要

Provided are an antistatic apparatus capable of preventing dust from being scattered and adhering to a substrate to obtain a high quality product and a substrate processing apparatus with the same. This apparatus includes: covers (14, 16) covering a surface of an unprocessed substrate (W) while having a space; and an ionizer (20) installed in the covers (14, 16). Through the ionizer (20), this invention is possible to prevent the electrification of the unprocessed substrate (W) or the dust intruded into the covers (14, 16) to prevent the dust from adhering to the surface of the substrate, and is possible to improve the efficiency of electricity removal by providing the ionizer (20) in the sealed covers (14,16).