首页> 外国专利> DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, METHOD FOR MANUFACTURING CIRCULARLY POLARIZED PLATE OR ELLIPTICALLY POLARIZED PLATE, AND METHOD FOR MANUFACTURING PHASE DIFFERENCE PLATE

DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, METHOD FOR MANUFACTURING CIRCULARLY POLARIZED PLATE OR ELLIPTICALLY POLARIZED PLATE, AND METHOD FOR MANUFACTURING PHASE DIFFERENCE PLATE

机译:缺陷检查装置,缺陷检查方法,圆弧形或椭圆形极化板的制造方法以及相差板的制造方法

摘要

Provided are a defect inspection device and a defect inspection method for inspecting a defect of a circularly polarized plate or an elliptically polarized plate or a phase difference plate used for generating circularly polarized light or elliptically polarized light and realizing high versatility, a method for manufacturing a circularly polarized plate or an elliptically polarized plate, and a method for manufacturing a phase difference plate using the defect inspection method. A defect inspection device (10) according to one embodiment is a defect inspection device for inspecting defects of a circularly polarized plate (12) or an elliptically polarized plate having a linearly polarized plate (20) and a phase difference plate (22) and includes a light irradiation unit (14) disposed on the linearly polarized plate side of the circularly polarized plate or the elliptically polarized plate and emitting inspection light to an imaging region (A) of the circularly polarized plate or the elliptically polarized plate, a reflecting member (16) reflecting the light output from the circularly polarized plate or the elliptically polarized plate irradiated with the inspection light toward the circularly polarized plate or the elliptically polarized plate and disposed on the side opposite to the light irradiation unit when viewed from the circularly polarized plate or the elliptically polarized plate, and an imaging unit (18) disposed on the same side as the light irradiation unit when viewed from the circularly polarized plate or the elliptically polarized plate.;COPYRIGHT KIPO 2019
机译:本发明提供一种缺陷检查装置和缺陷检查方法,其用于检查圆偏振板或椭圆偏振板或用于产生圆偏振光或椭圆偏振光的相位差板的缺陷并实现高通用性的缺陷检查装置和方法。圆偏光板或椭圆偏光板,以及使用缺陷检查方法制造相差板的方法。根据一个实施例的缺陷检查装置(10)是用于检查圆偏振片(12)或具有线性偏振片(20)和相差片(22)的椭圆偏振片的缺陷的缺陷检查装置,并且包括设置在圆偏光板或椭圆偏光板的线偏光板侧并向圆偏光板或椭圆偏光板的成像区域(A)发射检查光的光照射单元(14),反射部件( 16)将从圆偏振板或椭圆偏振板输出的,由检查光照射的光反射到圆偏振板或椭圆偏振板,并从圆偏振板观察时设置在与光照射单元相反的一侧。椭圆偏振片和与光照射面位于同一侧的摄像单元(18)从圆偏振片或椭圆偏振片观看时的离子单位。; COPYRIGHT KIPO 2019

著录项

  • 公开/公告号KR20190030168A

    专利类型

  • 公开/公告日2019-03-21

    原文格式PDF

  • 申请/专利权人 SUMITOMO CHEMICAL CO. LTD.;

    申请/专利号KR20180107575

  • 发明设计人 NIWA TAIKI;

    申请日2018-09-10

  • 分类号G01N21/896;G01N21/21;G01N21/958;

  • 国家 KR

  • 入库时间 2022-08-21 11:51:21

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