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IMAGE SENSOR DEVICE STRUCTURE WITH DOPING LAYER IN LIGHT-SENSING REGION

机译:光感测领域中具有掺杂层的图像传感器结构

摘要

According to the present invention, an image sensor device structure is provided. The image sensor device structure includes a substrate, and the substrate is doped with a first conductivity type. The image sensor device structure includes a photo-sensing region formed in the substrate, and the photo-sensing region is doped with a second conductivity type different from the first conductivity type. The image sensor device structure further includes a doped region extending into the photo-sensing region, wherein the doped region is doped with the first conductivity type. The image sensor device structure further includes a plurality of color filters formed on the doped region.
机译:根据本发明,提供了一种图像传感器装置结构。图像传感器装置结构包括基板,并且该基板被掺杂有第一导电类型。图像传感器装置结构包括形成在基板中的光敏区域,并且该光敏区域掺杂有不同于第一导电类型的第二导电类型。图像传感器器件结构还包括延伸到光敏区域中的掺杂区域,其中该掺杂区域以第一导电类型掺杂。图像传感器装置结构还包括形成在掺杂区域上的多个滤色器。

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