How to Construct Optical Layers in Imprint Lithography Processes

摘要

An imprint lithography method for constructing an optical layer comprises imprinting first features of primary scale size with a patterning template on a side of a substrate, while simultaneously applying a second scale size with a patterning template on the side of the substrate. Imprinting two features, wherein the second features are sized and arranged to define a gap between the adjacent surface and the substrate.