Prize-processing methods, computer storage media and prize-processing devices

摘要

The development method for developing a resist film on a substrate includes: a pattern forming step of supplying a developing solution to the substrate to develop a resist film on the substrate to form a resist pattern; a coating step of applying an aqueous solution of a water-soluble polymer to the developed substrate; And a rinse step of cleaning the substrate by supplying a rinse liquid to the substrate coated with the aqueous solution of the water-soluble polymer.