WIDE DYNAMIC RANGE ION ENERGY BIAS CONTROL FAST ION ENERGY SWITCHING ION ENERGY CONTROL AND PULSED BIAS SUPPLY AND A VIRTUAL FRONT PANEL

摘要

The present invention relates to a system, method and apparatus for operating a plasma processing chamber. In particular, the periodic voltage function combined with ion current compensation is provided as a bias to the substrate support as a modified periodic voltage function. This affects the DC bias on the surface of the substrate which controls the energy of ions incident on the surface of the substrate. The peak-to-peak voltage of the periodic voltage function can control the ion energy, and the ion compensation current can control the width of the ion energy distribution function of the ions. By controlling the width of the periodic voltage function, it is possible to provide a means for calculating the sheath capacity of the plasma sheath and the ion current of the plasma. The ion energy distribution function can be adjusted and multiple ion energy peaks can be generated, all of which are under control of the modified periodic voltage function.