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- - MOLYBDENUM-CONTAINING COMPOUND PRECURSOR COMPOSITION INCLUDING MOLYBDENUM-CONTAINING COMPOUND FOR LAYER DEPOSITION AND DEPOSITING METHOD OF LAYER USING THE SAME
- - MOLYBDENUM-CONTAINING COMPOUND PRECURSOR COMPOSITION INCLUDING MOLYBDENUM-CONTAINING COMPOUND FOR LAYER DEPOSITION AND DEPOSITING METHOD OF LAYER USING THE SAME
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机译:---含钼化合物前体组合物,其包含用于层沉积的含钼化合物和使用该层的沉积方法
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摘要
Provided are a novel molybdenum-containing compound, a precursor composition for film deposition comprising a molybdenum-containing compound, and a method for depositing a molybdenum-containing film using the precursor composition. The molybdenum-containing compound according to an embodiment of the present application can be applied to various fields such as a catalyst and the like.
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