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4 - GROUP 4 METAL ELEMENT-CONTAINING COMPOUND PREPARING METHOD THEREOF PRECURSOR COMPOSITION INCLUDING THE SAME FOR LAYER DEPOSITION AND DEPOSITING METHOD OF LAYER USING THE SAME
4 - GROUP 4 METAL ELEMENT-CONTAINING COMPOUND PREPARING METHOD THEREOF PRECURSOR COMPOSITION INCLUDING THE SAME FOR LAYER DEPOSITION AND DEPOSITING METHOD OF LAYER USING THE SAME
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机译:包含用于层沉积的相同成分的4-4类含金属元素的化合物的制备方法以及使用该方法的层沉积方法
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摘要
The present invention relates to a novel group 4 metal element-containing compound, to a production method of the group 4 metal element-containing compound, to a precursor composition for film deposition, comprising the group 4 metal element-containing compound, and to a deposition method of the group 4 metal element-containing film using the precursor composition.
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