首页> 外国专利> PATTERN DRAWING DEVICE PATTERN DRAWING METHOD DEVICE MANUFACTURING METHOD LASER LIGHT SOURCE DEVICE BEAM SCANNING DEVICE AND BEAM SCANNING METHOD

PATTERN DRAWING DEVICE PATTERN DRAWING METHOD DEVICE MANUFACTURING METHOD LASER LIGHT SOURCE DEVICE BEAM SCANNING DEVICE AND BEAM SCANNING METHOD

机译:图案描绘装置图案描绘方法装置制造方法激光光源装置光束扫描装置及光束扫描方法

摘要

A pattern writing apparatus for drawing a predetermined pattern on a workpiece by a scanning spot of a laser beam, comprising: a light source device (14) for emitting the laser beam; A plurality of imaging units (U1 to U6) arranged to scan the other area on the object, the scanning spot including an optical scanning unit and a scanning scanning member for scanning light; and a plurality of imaging units And a plurality of selection optical elements (50, 58, 66) arranged in series along the traveling direction of the laser light from the light source device in order to switch whether or not to enter the selected imaging unit among the imaging units.
机译:一种用于通过激光束的扫描点在工件上绘制预定图案的图案写入设备,包括:光源装置(14),用于发射激光束;多个成像单元(U1至U6)被布置为扫描物体上的另一区域,该扫描点包括光学扫描单元和用于扫描光的扫描扫描部件;以及沿从光源装置发出的激光的行进方向串联排列的多个摄像单元和多个选择光学元件(50、58、66),以切换是否进入所选择的摄像单元。成像单元。

著录项

  • 公开/公告号KR101963488B1

    专利类型

  • 公开/公告日2019-03-28

    原文格式PDF

  • 申请/专利权人 가부시키가이샤 니콘;

    申请/专利号KR20167029590

  • 发明设计人 가토 마사키;

    申请日2015-04-27

  • 分类号G03F7/20;G02B26/10;G02B26/12;G02F1/03;G02F1/11;G02F1/37;G03F7/24;

  • 国家 KR

  • 入库时间 2022-08-21 11:48:50

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