首页> 外国专利> A semiconductor device including structure in which a plurality of distributed power amplifiers are power-combined and a manufacturing method for the same

A semiconductor device including structure in which a plurality of distributed power amplifiers are power-combined and a manufacturing method for the same

机译:包括其中多个分布式功率放大器被功率组合的结构的半导体器件及其制造方法

摘要

According to a part of an embodiment of the present invention, disclosed is a semiconductor device having a structure coupling multiple distributed power amplifiers with power which comprises: a first gate line formed by connecting gate electrodes of multiple transistors included in a first distributed power amplifier among the multiple distributed power amplifiers; and a first drain line formed by connecting drain electrodes of the multiple transistors included in the first distributed power amplifier. Each of the first gate line and the first drain line can be shared with at least one of a second gate line and a second drain line of a second distributed power amplifier adjacent to the first distributed power amplifier among the multiple distributed power amplifiers.
机译:根据本发明的实施例的一部分,公开了一种半导体器件,该半导体器件具有将多个分布式功率放大器与功率耦合的结构,该半导体器件包括:第一栅极线,其通过将包括在第一分布式功率放大器中的多个晶体管的栅电极连接而形成。多个分布式功率放大器;通过连接包括在第一分布式功率放大器中的多个晶体管的漏极形成的第一漏极线。第一栅极线和第一漏极线中的每一个可以与多个分布式功率放大器中的与第一分布式功率放大器相邻的第二分布式功率放大器的第二栅极线和第二漏极线中的至少一个共享。

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