首页> 外国专利> PHOTORESIST BUBBLE CLEAR RECLAIM SUPPLY SYSTEM

PHOTORESIST BUBBLE CLEAR RECLAIM SUPPLY SYSTEM

机译:光阻气泡透明补给系统

摘要

The present invention relates to a photoresist liquid bubble removal and regeneration supply device to remove air introduced into a container when the container filled with a photoresist liquid is replaced and to regenerate the photoresist liquid by removing the air existing in a bubble form in the photoresist liquid. According to the present invention, the photoresist liquid bubble removal and regeneration supply device comprises: a container filled with the photoresist liquid and having a cap connected to an opening; an air exhaust means removing the air introduced into a space inside the container when the container is replaced; a photoresist liquid circulating means circulating the photoresist liquid by injecting a pressurized gas into the container, and removing the air and the pressurized gas existing in the form of bubbles in the photoresist liquid to regenerate the photoresist liquid; and a photoresist liquid supply means supplying the photoresist liquid regenerated by the photoresist liquid circulation means to a place of intended use.
机译:光刻胶液气泡去除和再生供应装置技术领域本发明涉及一种光刻胶液气泡去除和再生供给装置,其用于在更换装有光刻胶液的容器时去除引入到容器中的空气,并通过去除在光刻胶液中以气泡形式存在的空气来再生光刻胶液。 。根据本发明,光致抗蚀剂液体气泡去除和再生供应装置包括:容器,其填充有光致抗蚀剂液体并且具有连接至开口的盖;以及容器。排气装置是指在更换容器时除去引入到容器内部空间的空气。光致抗蚀剂液体循环装置是通过向容器中注入加压气体并除去光致抗蚀剂液体中以气泡形式存在的空气和加压气体以使光致抗蚀剂液体再生而使光致抗蚀剂液体循环。光致抗蚀剂液体供应装置将由光致抗蚀剂液体循环装置再生的光致抗蚀剂液体供应到预期的使用场所。

著录项

  • 公开/公告号KR101976429B1

    专利类型

  • 公开/公告日2019-05-10

    原文格式PDF

  • 申请/专利权人 ARISOL-TECH CO. LTD.;

    申请/专利号KR20180032655

  • 发明设计人 WON DOH HI;

    申请日2018-03-21

  • 分类号G03F7/30;G03F7/06;H01L21/027;H01L21/67;

  • 国家 KR

  • 入库时间 2022-08-21 11:48:40

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