首页> 外国专利> PHOTORESIST SUPPLY APPARATUS TO PREVENT AIR BUBBLE GENERATED IN REPLACING STORING UNIT FROM BEING INTRODUCED TO SUPPLY LINE

PHOTORESIST SUPPLY APPARATUS TO PREVENT AIR BUBBLE GENERATED IN REPLACING STORING UNIT FROM BEING INTRODUCED TO SUPPLY LINE

机译:用光致抗蚀剂供应装置防止存储单元中产生的气泡从引入供应线中

摘要

Purpose: a photoresist power supply device is arranged to prevent bubble, it is generated, replacing a store unit horizontally bending to be inserted in terms of photoresist is directed to the inside of a supply line from one end of the supply line in the surge tank that store unit is provided. Construction: photoresist is stored in a store unit. One surge tank buffers the photoresist provided from store unit. Store unit is connected to surge tank by a supply line (130a, 130b). A part of supply line is inserted into surge tank, one end bending of supply line.
机译:目的:设置光致抗蚀剂电源装置以防止气泡的产生,替换水平弯曲要插入的存储单元,将光致抗蚀剂从调压箱中的供应管线的一端引向供应管线的内部提供了存储单元。结构:光致抗蚀剂存储在存储单元中。一个缓冲罐缓冲从存储单元提供的光刻胶。存储单元通过供应管线(130a,130b)连接到调压罐。供应管线的一部分插入调压罐,供应管线的一端弯曲。

著录项

  • 公开/公告号KR20050014232A

    专利类型

  • 公开/公告日2005-02-07

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20030052756

  • 发明设计人 JUNG DAE CHOUL;

    申请日2003-07-30

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 22:05:54

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