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Integrated circuits with a semiconductor device in thin-film SOI technology and method for producing the same

机译:具有薄膜SOI技术的半导体器件的集成电路及其制造方法

摘要

Integrated circuit with: a semiconductor device in thin film silicon on insulator technology comprising: a semiconductor substrate (112) of a first conductivity type, an insulator layer (114) and a semiconductor layer (116), wherein the insulator layer (114) is disposed on the semiconductor substrate (112) and the semiconductor layer (116) is disposed on the insulator layer (114); a first semiconductor layer structure (142) in the semiconductor layer (116); a second semiconductor layer structure (144) in the semiconductor layer (116) separated from the first semiconductor layer structure (142) and laterally spaced; a first semiconductor substrate structure (132) of a second conductivity type inverse to the first conductivity type disposed in the semiconductor substrate (112) under the first semiconductor layer structure (142); a second semiconductor substrate structure (134) of the second conductivity type disposed in the semiconductor substrate (112) below the second semiconductor layer structure (144) and laterally spaced from the first semiconductor substrate structure (132); and a third semiconductor substrate structure (133) of the first conductivity type which underlies the first semiconductor layer structure (142) in the semiconductor substrate (114) is disposed and otherwise surrounded by the first semiconductor substrate structure (132); wherein the first semiconductor substrate structure (132), the semiconductor substrate (112) and the second semiconductor substrate structure (134) form a bipolar transistor structure, wherein the third semiconductor substrate structure (133) and the first semiconductor layer structure (142) are connected to the same first voltage potential (136), and wherein the first semiconductor substrate structure (132), the second semiconductor substrate structure (134) and the second semiconductor layer structure (144) are connected to the same second voltage potential (138).
机译:一种集成电路,具有:绝缘体上薄膜硅技术的半导体器件,包括:第一导电类型的半导体衬底(112),绝缘体层(114)和半导体层(116),其中,绝缘体层(114)是设置在半导体衬底(112)上,并且将半导体层(116)设置在绝缘体层(114)上;半导体层(116)中的第一半导体层结构(142);半导体层(116)中的第二半导体层结构(144)与第一半导体层结构(142)分离并横向间隔开;与第一导电类型相反的第二导电类型的第一半导体衬底结构(132)设置在第一半导体层结构(142)下方的半导体衬底(112)中;第二导电类型的第二半导体衬底结构(134)设置在第二半导体层结构(144)下方的半导体衬底(112)中,并与第一半导体衬底结构(132)横向间隔开;布置并且以其他方式被第一半导体衬底结构(132)围绕,该第一导电类型的第三半导体衬底结构(133)位于半导体衬底(114)中的第一半导体层结构(142)的下面。其中第一半导体衬底结构(132),半导体衬底(112)和第二半导体衬底结构(134)形成双极晶体管结构,其中第三半导体衬底结构(133)和第一半导体层结构(142)是连接至相同的第一电压电位(136),并且其中第一半导体衬底结构(132),第二半导体衬底结构(134)和第二半导体层结构(144)连接至相同的第二电压电位(138) 。

著录项

  • 公开/公告号DE102008034158B4

    专利类型

  • 公开/公告日2019-08-14

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AUSTRIA AG;

    申请/专利号DE102008034158

  • 发明设计人 UWE WAHL;

    申请日2008-07-22

  • 分类号H01L23/60;H01L27/12;H01L21/84;

  • 国家 DE

  • 入库时间 2022-08-21 11:45:51

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