首页> 外国专利> POLARIZATION ELECTRIC FIELD ASSISTED HOLE SUPPLIER AND P-TYPE CONTACT STRUCTURE, LIGHT EMITTING DEVICE AND PHOTODETECTOR USING THE SAME

POLARIZATION ELECTRIC FIELD ASSISTED HOLE SUPPLIER AND P-TYPE CONTACT STRUCTURE, LIGHT EMITTING DEVICE AND PHOTODETECTOR USING THE SAME

机译:极化电场辅助的孔供应商和使用该电极的P型接触结构,发光器件和光电检测器

摘要

A hole supplier and p-contact structure for a light emitting device or a photodetector includes a p-type group III nitride structure and a hole supplier and p-contact layer made of Al-containing group III nitride formed on the p-typegroup III nitride structure and being under a biaxial inplane tensile strain, the hole supplier and p-contact layer has a thickness in the range of 0.6-10 nm, and the p-type group III nitride structure is formed over an active region of the light emitting device or photodetector. A light emitting device and a photodetector with a hole supplier and p-contact structure.
机译:用于发光器件或光检测器的空穴供应商和p接触结构包括p型III族氮化物结构和由在p型III族氮化物上形成的含Al的III族氮化物制成的空穴供应商和p接触层在双轴面内拉伸应变的情况下,空穴供给层和p接触层的厚度在0.6-10nm的范围内,并且在发光器件的有源区域上形成p型III族氮化物结构。或光电探测器。具有空穴供应器和p接触结构的发光器件和光电检测器。

著录项

  • 公开/公告号EP3699964A1

    专利类型

  • 公开/公告日2020-08-26

    原文格式PDF

  • 申请/专利权人 BOLB INC.;

    申请/专利号EP20190158922

  • 发明设计人 ZHANG JIANPING;GAO YING;ZHOU LING;

    申请日2019-02-22

  • 分类号H01L33/04;H01L33/14;H01L31/0304;H01L31/09;H01L33/32;

  • 国家 EP

  • 入库时间 2022-08-21 11:39:44

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