首页> 外国专利> Vapor deposition mask and its manufacturing method, vapor deposition mask device and its manufacturing method, intermediate, vapor deposition method, and organic EL display device manufacturing method

Vapor deposition mask and its manufacturing method, vapor deposition mask device and its manufacturing method, intermediate, vapor deposition method, and organic EL display device manufacturing method

机译:气相沉积掩模及其制造方法,气相沉积掩模装置及其制造方法,中间体,气相沉积方法以及有机EL显示装置的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition mask capable of accurately joining the intermediate body to the opening of the support body when stacking and reinforcing the intermediate body of the vapor deposition mask on the support body in order to increase the strength in the production of the vapor deposition mask. In a vapor deposition mask 20 including a mask body 30 and a support body 40 bonded to the mask body, the mask body has a first alignment mark 34, and the support body has a second alignment mark 44. The first alignment mark and the second alignment mark are provided at positions where they overlap each other in a plan view, and one of them is larger than the other. [Selection diagram] Fig. 3
机译:解决的问题:提供一种气相沉积掩模,该气相沉积掩模能够在将气相沉积掩模的中间体堆叠并加固在支撑体上时准确地将中间体接合到支撑体的开口上,以增加生产中的强度。蒸镀掩模的厚度。在包括掩模主体30和结合到掩模主体的支撑主体40的气相沉积掩模20中,掩模主体具有第一对准标记34,并且支撑主体具有第二对准标记44。第一对准标记和第二对准标记对准标记在平面图中彼此重叠的位置处提供,并且其中一个大于另一个。 [选择图]图3

著录项

  • 公开/公告号JP2020122216A

    专利类型

  • 公开/公告日2020-08-13

    原文格式PDF

  • 申请/专利权人 大日本印刷株式会社;

    申请/专利号JP20190235052

  • 发明设计人 池永 知加雄;

    申请日2019-12-25

  • 分类号C23C14/04;H01L51/50;H05B33/10;

  • 国家 JP

  • 入库时间 2022-08-21 11:37:52

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