PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus, a substrate processing apparatus, a substrate inspection method and a substrate processing method capable of detecting defects on the surface of a substrate with high reliability. SOLUTION: A sample substrate and a substrate to be inspected are imaged by an imaging unit. The image data of the substrate of the sample obtained by imaging and the image data of the substrate to be inspected are acquired. A value corresponding to the difference in pixel values is calculated as a difference pixel value for the pixels corresponding to each other of the acquired sample image data and the target image data, and the difference image data composed of a plurality of difference pixel values is generated. From the difference image represented by the difference image data, pixels whose difference pixel value is out of the predetermined allowable range are determined, and the determined region is extracted as a defect candidate portion. Whether or not the extracted defect candidate portion represents an actual defect is determined based on one or more feature parameters corresponding to the feature of the defect. [Selection diagram] Fig. 4
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