Post-CMP cleaning liquid, cleaning method and semiconductor wafer manufacturing method

摘要

PROBLEM TO BE SOLVED: To provide a cleaning liquid after CMP having excellent iron compound removing property and antibacterial property without dissolving tungsten. Further, the present invention provides a cleaning method having excellent iron compound removability without dissolving tungsten. SOLUTION: A CMP cleaning liquid containing a component (A): an antibacterial agent and a component (B): a carboxyl group-containing amine compound. A cleaning method for cleaning a semiconductor wafer using the cleaning liquid after CMP. A method for manufacturing a semiconductor wafer, which comprises a step of cleaning the semiconductor wafer with the cleaning liquid after CMP. [Selection diagram] None