Semiconductor manufacturing equipment and display manufacturing equipment including semiconductor manufacturing equipment members and semiconductor manufacturing equipment members

摘要

PROBLEM TO BE SOLVED: To provide a member for a semiconductor manufacturing apparatus capable of reducing particles. SOLUTION: A base material including a first surface, a second surface intersecting the first surface, and a ridge portion connecting the first surface and the second surface, and the first surface, said. A particle-resistant layer that covers the second surface and the ridge portion and contains polycrystalline ceramics, the first particle-resistant layer provided on the ridge portion and the second particle-resistant layer provided on the first surface. Provided is a member for a semiconductor manufacturing apparatus comprising a particle-resistant layer including and, wherein the particle resistance of the first particle-resistant layer is higher than the particle resistance of the second particle-resistant layer. [Selection diagram] Fig. 2