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Lithographic method with combined optimization of radiant energy and design shape
Lithographic method with combined optimization of radiant energy and design shape
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机译:结合辐射能和设计形状优化的光刻方法
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摘要
A lithography method for a pattern to be etched on a support, notably to a method using electron radiation with direct writing on the support. Hitherto, the methods for correcting the proximity effects for dense network geometries (line spacings of 10 to 30 nm) have been reflected in a significant increase in the radiated doses and therefore in the exposure time. According to the invention, the patterns to be etched are modified as a function of the energy latitude of the process, which allows a reduction of the radiated doses.
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