PRODUCTION METHOD OF SILICON FINE PARTICLE HAVING SURFACE PORE, AND SILICON FINE PARTICLE

摘要

To provide means for forming fine pores on a surface of a silicon fine particle by use of a simple operation and an inexpensive material.SOLUTION: A first etching step is performed, in which silicon fine particles are immersed in a solution containing hydrofluoric acid and a transition metal ion so as to precipitate particles of the transition metal on the surfaces of the silicon fine particles, as well as to etch the surfaces of the silicon fine particles with the hydrofluoric acid, the surfaces where, resulting from the precipitation, a contact portion with the precipitated transition metal particles is oxidized. The transition metal particles are removed from the silicon fine particles subjected to the first etching step.SELECTED DRAWING: Figure 1