A device for holding a substrate in a vacuum deposition process, a system for depositing layers on a substrate, and a method for holding a substrate.

摘要

PROBLEM TO BE SOLVED: To provide a device, a system, and a method for reliably holding a substrate and an optional mask in a precisely aligned orientation during a vacuum deposition process. An apparatus (100) for holding a substrate (10) in a vacuum deposition process applies an attractive force acting on at least one of a support surface (112), a substrate (10) and a mask (20). An electrode arrangement (120) having a plurality of electrodes (122) configured as described above, and an electrode arrangement (120) having a first voltage polarity setting and a second voltage polarity setting different from the first voltage polarity setting. A controller (130) configured to apply to, including a controller (130) configured to switch between a first voltage polarity setting and a second voltage polarity setting. [Selection diagram] FIG. 1A